Litography-research and Development, Nanotechnology

01.05.1994 - 30.12.2010

Research funding project

Development of new resist technologies; DUV-Excimer-Laser Ablation Technology by using high energetic Photons; Thinfilmtechnology with Triode-Sputtering equipment; RIE-Nanostructuring with gas-chopping Systems

People

Project leader

Günther Stangl (E366)

Project personnel

Claudia Benedela (E366)
Sabine Fuchs (E366)

Institute

E366 - Institute of Sensor and Actuator Systems

Grant funds

BM f. Klimaschutz, Umwelt, Energie, Mobilität, Innovation u.Technologie (National) Federal Ministry of Transport, Innovation and Technology (bm:vit)

Research focus

Special and Engineering Materials: 35%
Structure-Property Relationsship: 30%
Materials Characterization: 35%

Keywords

German	English
Nonostrukturierung	Nanostructuring
"Ätzen mit Licht" (Ablation)	"Etching by Photones" (Ablation)
reaktives Plasmaätzen	reactive Plasma-Etching
Mehrlagenfotolacktechnologie	bi- and trilevel Resisttechnology

Publications

Publications