362.149 Processing Chemistry for Micro- and Nanoelectronics
This course is in all assigned curricula part of the STEOP.
This course is in at least 1 assigned curriculum part of the STEOP.

2022S, VU, 2.0h, 3.0EC, to be held in blocked form

Properties

  • Semester hours: 2.0
  • Credits: 3.0
  • Type: VU Lecture and Exercise
  • Format: Distance Learning

Learning outcomes

After successful completion of the course, students are able to..

.. apply basic principles of chemistry to the processes of microfabrication
... understand the chemical processes for etching, deposition, cleaning in process technology
... independently mix a buffered hydrofluoric acid acid from the individual components
... independently design processes for electrode deposition of copper layers (V, A, duration)
... select gas flows for dry processes according to the reaction stoichiometry
... to work on wet workbenches in the clean room with acids, alkalis and solvents

 

Subject of course

Theory:
Chemical concepts (pH, electrochemistry, reaction mechanisms, ... and much more), thermodynamics, kinetics,
Microfabrication processes (lithography, RIE, CVD, ...), which are based on chemical processes.

Application:
Calculation examples for gas processes, etching processes, equilibrium reactions, etc.

Experimental exercise:
Safe handling of chemicals (acids, solvents, gases)

Teaching methods

Lecture supported with ppt slides and blackboard drawings

Application of chemical principles to everyday issues
Application of the chemical principles to questions of semiconductor technology
Joint development of chemical formulas and reaction equations
Common physico-chemical calculations

Mode of examination

Oral

Additional information

** ATTENTION Please register for LVA in TISS ***

Scheduling Meeting: 02.03.2020 - 15h - Sem 362-2


The lecture exercise “Process Chemistry” will be held as a BLOCK LECTURE in SS2020.
In SS2020, the lecture will be arranged as agreed at the preliminary meeting on March 2nd, 2020 from March 3rd. until 11.03. in the morning from 9 am to 1 pm.
The exact schedule will be determined in the planning session on March 2nd, 2020 together with all students present.
  Location:  NanoCenter - Building CH

                 Gusshausstrasse 25a
                 Seminar room 2nd floor

In SS2020

For the lecture: Please bring your pocket calculator!

Lecturers

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Institute

Course dates

DayTimeDateLocationDescription
Mon15:00 - 18:0001.03.2021 - 08.03.2021Besprechungsraum 362 - 2 Prozesschemie
15:00 - 18:0002.03.2021 - 12.03.2021Besprechungsraum 362 - 2 362.149: Prozesschemie für Mikro- und Nanoelektronik
Processing Chemistry for Micro- and Nanoelectronics - Single appointments
DayDateTimeLocationDescription
Mon01.03.202115:00 - 18:00Besprechungsraum 362 - 2 Prozesschemie
Tue02.03.202115:00 - 18:00Besprechungsraum 362 - 2 362.149: Prozesschemie für Mikro- und Nanoelektronik
Wed03.03.202115:00 - 18:00Besprechungsraum 362 - 2 362.149: Prozesschemie für Mikro- und Nanoelektronik
Thu04.03.202115:00 - 18:00Besprechungsraum 362 - 2 362.149: Prozesschemie für Mikro- und Nanoelektronik
Fri05.03.202115:00 - 18:00Besprechungsraum 362 - 2 362.149: Prozesschemie für Mikro- und Nanoelektronik
Mon08.03.202115:00 - 18:00Besprechungsraum 362 - 2 Prozesschemie
Mon08.03.202115:00 - 18:00Besprechungsraum 362 - 2 362.149: Prozesschemie für Mikro- und Nanoelektronik
Tue09.03.202115:00 - 18:00Besprechungsraum 362 - 2 362.149: Prozesschemie für Mikro- und Nanoelektronik
Wed10.03.202115:00 - 18:00Besprechungsraum 362 - 2 362.149: Prozesschemie für Mikro- und Nanoelektronik
Thu11.03.202115:00 - 18:00Besprechungsraum 362 - 2 362.149: Prozesschemie für Mikro- und Nanoelektronik
Fri12.03.202115:00 - 18:00Besprechungsraum 362 - 2 362.149: Prozesschemie für Mikro- und Nanoelektronik
Course is held blocked

Examination modalities

Participation in interactive lessons, pre-calculation of examples on the blackboard, repetition of lessons

Finally oral interview with bi to 3 calculation examples

 

 

Course registration

Begin End Deregistration end
31.01.2022 10:00 07.03.2022 18:00 06.06.2022 10:00

Registration modalities

TISS-Registration unlocks access to support material for this lecture

Curricula

Literature

No lecture notes are available.

Previous knowledge

Knowledge of Lithography, CVD, RIE

Preceding courses

Accompanying courses

Continuative courses

Language

if required in English