362.151 Semiconductor Process Modeling
This course is in all assigned curricula part of the STEOP.
This course is in at least 1 assigned curriculum part of the STEOP.

2018W, VU, 2.0h, 3.0EC

Properties

  • Semester hours: 2.0
  • Credits: 3.0
  • Type: VU Lecture and Exercise

Aim of course

Familiarity with simulation methods of computational materials science and application to nanofabrication with ion beams.

Subject of course

1. Nanofabrication with ion beams
2. Molecular dynamics
3. Interatomic potentials
4. Mechanical stress
5. Binary collision simulations, coupling with continuum mechanics
6. Multiscale modeling for the simulation of bubble evolution in Si
7. Spontaneous pattern formation by ion bombardment
About half of the course is obtaining hands-on experience with the molecular dynamics simulator LAMMPS.

Additional information

The lecture times will be scheduled in the kick-off meeting. The simulation exercises can be scheduled individually.

Lecturers

Institute

Course dates

DayTimeDateLocationDescription
Thu13:00 - 14:0004.10.2018Seminarraum 362 - 1 Introduction

Examination modalities

Presentation of simulations, oral exam.

Course registration

Begin End Deregistration end
02.09.2018 00:00 04.10.2018 23:59

Curricula

Study CodeSemesterPrecon.Info
066 508 Microelectronics and Photonics

Literature

 

 

Previous knowledge

This course extends the part "Computational Materials Science" of VU 362.152 Materials, processes and technologies of microelectronics.The courses can be taken in arbitrary order.

Language

German