After successful completion of the course, students are able to analyse state of the art mechanisms and tools for the fabrication of ultrathin films, nanowires and quantum dots as well as to evaluate the key analytical methods for the characterization of nanostructures and their physical properties and functionalities.
The main content of this course is the knowledge of procedures for the fabrication and characterization of nanoscale low-dimensional systems. Novel materials or devices can take advantage of known physical phenomena that can be improved by nanostructuring, or use entirely new principles.After a presentation of the basic properties of nanostructures and scaling effects follows a description of commonly used techniques for thin film deposition, including thermal evaporation, sputtering and chemical vapor deposition. For the lateral structuring, the latest optical methods, electron beam lithography and Nanoimprint-technology are described. Finally, especially chemical production methods and principles of self - organization will be explained.
