Novel materials or devices can take advantage of known physical phenomena that can be improved by nanostructuring, or use entirely new principles. Contents of the lecture, which is accompanied by exercise, are various methods for nanostructuring of low dimensional systems. Furthermore, the key analytical methods for the characterization of nanostructures and their physical properties and functionalities will be presented.

The main content of this course is the knowledge of procedures for the fabrication and characterization of nanoscale low-dimensional systems. After a presentation of the basic properties of nanostructures and scaling effects follows a description of commonly used techniques for thin film deposition, including thermal evaporation, sputtering and chemical vapor deposition. For the lateral structuring, the latest optical methods, electron beam lithography and Nanoimprint-technology are described. Finally, especially chemical production methods and principles of self - organization will be explained.

Oral exam at the end of the course