Learn and compare the deposition and epitaxy methods for the production of high quality crystalline layers, and a physical understanding of the layer growth of nanostructures. Estimate which material systems can be produced technically to form heterostructures (in principle, with which method, which quality, effort, etc.). Addressing the following issues: crystal structures, single crystal fabrication and analysis, thin film fabrication, doping (doping methods), vacuum engineering, material sources, "in situ" and "ex situ" analysis, possible devices.

An introduction to the physics of various deposition and epitaxial growth techniques for the production of single crystal thin films and heterostructures, an explanation and comparison of research and industrial techniques, plus characterization methods for the production of epitaxial structures (Dielectrics, Semiconductors, Metals / Superconductors), description of various growth methods (MBE, MO-MBE, ALE, CVD, MO) CVD, laser CVD, PA-CVD, LPE, etc.) and the necessary equipment (vacuum technology, material sources, substrate pre-treatment, etc.), doping methods, "in situ" and "ex situ" analysis methods (composition, purity, structure analysis, charge carriers , optical and electrical properties), production methods for nanostructures by various growth techniques (quantum wires by overgrowth, etc.), and a discussion of possible application of the latest material systems.