After successful completion of the course, students are able to...

to name all major manufacturing processes of micro- & nano-structuring and to explain the principles. The students learn to compare different production processes and to weigh the pros and cons critically. This LVA gives students the understanding to develop process sequences for the complete production of components of microelectronics, photonics and microsystems technology by combining the learned manufacturing processes independently.

Comprehensive knowledge of the processes and technologies that form the basis for modern nanoelectronics, nanophotonics and microsystems technology. Elemental and compound semiconductor of group IV and III-V and oxide ceramics are the focus on the material side.

Process technologies for the manufacture of micro- and nano-scale, 1-, 2- and 3-dimensional structures, components and devices. Primary concerns are the key processes including layer structure with photo- and electron beam lithography and etching techniques with RF plasma processes, selective growth processes for (quasi-) 1-, 2- dimensional structures such as nanodots and nanowires, and in-situ and ex-situ Characterization methods.

Lecture supported with ppt slides and blackboard drawings
Narratives from the practice of industrial production
Case examples for application
Joint development of process sequences (process integration) for the production of a microelectronic or micromechanical device

2019 the lecture starts on 01. Okt 2019

13:00 - 15:00
Meeting room ISAS (CB0102),
Building Wing CB Favoritenstrasse - 1. Stock

Oral exam

The examination of the full lecture content can be taken at each of the lecturers - registration with the chosen examiner.

Examiner Wanzenböck:
Registration for given dates via TISS
Additional dates available on request at any time -
Appointments via alexandra.linster@tuwien.ac.at

Examiner Ulrich Schmid:
Dates by individual agreement

Examiner Gottfried Strasser:
Dates by individual agreement