Knowledge on key processes and technologies for the fabrication of modern Structures, Components and Devices for Nanoelectronics, Photonics and Microsystems.

Comprehensive knowledge of the processes and technologies that form the basis for modern nanoelectronics, nanophotonics and microsystems technology. Elemental and compound semiconductor of group IV and III-V and oxide ceramics are the focus on the material side.

Process technologies for the manufacture of micro- and nano-scale, 1-, 2- and 3-dimensional structures, components and devices. Primary concerns are the key processes including layer structure with photo- and electron beam lithography and etching techniques with RF plasma processes, selective growth processes for (quasi-) 1-, 2- dimensional structures such as nanodots and nanowires, and in-situ and ex-situ Characterization methods.

From 09. Okt 2018 the lecture will take place at

13:00 - 15:00
Meeting room ISAS (CB0102),
Building Wing CB Favoritenstrasse - 1. Stock

Oral exam

Each lecturer can be chosen as examiner for the full lecture content- Register with the selected Examiner.

Examiner Wanzenboeck:
Registration for stated dates via TISS.
Additional exam dates maybe arranged upon request -
Contact alexandra.linster@tuwien.ac.at