After successful completion of the course, students are able to ...
to understand the basic methods of semiconductor fabrication and / or analysis techniques for semiconductor devices.
through own experimental activities to grasp the principle of the techniques. to carry out microelectronics experiments after previous training
For physicists and chemists, this lab course offers the opportunity to gain practical experience in the cleanroom technology of microfabrication.
Laboratory work on structuring and characterization techniques in semiconductor manufacturing
Work program of the Group WEBER :
Electrical charactarization of Ge-Nanostructures - Details on request
Work program of the Group LUGSTEIN :
Research-guided investigations of ultrascale electrical, optical and plasmonic devices.
The actual work program depends on the current research work of the research group.
Work program of the group WANZENBOECK
Processing techniques of research-related areas (optional):
x) optical lithography and PVD metal deposition for cell culture microchip *
x) direct writing of metal structures (Local CVD with a focused electron beam) *
x) Topographic (AFM) and chemical (EDX) characterization of nanostructures *
x) Electrical characterization of microstructures (eg from Elekronenstrahlinduzierter deposition.)
x) other topics available on request
Basic practical knowledge in semiconductor technology
Duration: 3-day internship (other times available on request)
Start: by individual appointment (also possible during the holidays)
Group: max. 3 students
Grade: based on a laboratory report