After successful completion of the course, students are able to...
.... to independently combine the process of microfabrication for fabrication of simple devices
... to apply the basic processes of manufacturing integrated circuits or MEMS components.
... to select the appropriate analysis methods (e.g. atomic force microscopy or scanning electron microscopy) to solve the problem
The knowledge acquired can usually be deepened in a longer project work 362.092.
Laboratory work on structuring and characterization techniques in semiconductor manufacturing
Work program of the group WEBER
One focus of the group is new reconfigurable devices with programmable functionality, such as a transistor structure with multiple gate electrodes, di, depending on the wiring of the control electrodes, can operate as a transistor, AND logic or inverter, etc., details can be found here:
https://www.tuwien.at/etit/fke/forschung/nanoelektronische-bauelemente/rekonfigurierbare-elektronik
The laboratory schedule is based on the current needs of the ongoing research, and ranges from (delicate) characterization measurements with state of the art equipment to clean room activities. You can find out what can be done in detail during the internship by email from masiar.sistani@tuwien.ac.at.
Work program of the Group LUGSTEIN : on request
Work program of the group WANZENBOECK
Processing techniques of research-related areas (optional):
x) optical lithography and PVD metal deposition for cell culture microchip *
x) direct writing of metal structures (Local CVD with a focused electron beam) *
x) Topographic (AFM) and chemical (EDX) characterization of nanostructures *
x) Electrical characterization of microstructures (eg from Elekronenstrahlinduzierter deposition.)
x) other topics available on request
Basic practical knowledge in semiconductor technology
Duration: 3-day internship (other times available on request)
Start: by individual appointment (also possible during the holidays)
Group: max. 3 students
Grade: based on a laboratory report
Recommended in combination with
362.144 VO Prozesstechnologien der Mikroelektronik, Photonik und der Mikrosystemtechnik
362.152 VU Materialien, Prozesse und Technologien der Mikroelektronik
362.146 VU Prozesschemie für Mikro- und Nanoelektronik