After successful completion of the course, students are able to ...

... carry out experimental production processes in a clean room under supervision
... to carry out depositions or etching processes in the clean room with the electron beam or ion beam
    (eg to prepare cross-sections through circuits, to produce nanomagnets or plasmonic 3D gold structures)
... independently develop strategies for 3D nanostructuring
... combine and apply this particle beam-induced manufacturing method with other established methods
... to understand the requirements of diploma theses in the field of semiconductor technology
... to take a qualified decision to continue to work on the current research topic as part of a master's thesis

Specialized cleanroom laboratory courses using the focused ion beam (FIB) and / or the focused electron beam (FEB) of the Zeiss crossbeam system for the additive or subtractive production of nanostructures.

In this internship, students will learn about a key technology of modern silicon technology, nanostructuring with focused ion and electron beams. After compulsory safety training, trainees are introduced to work under clean room conditions. The focus of the internship is on state-of-the-art ion or electron beam devices for the production of nanometer-sized structures on silicon wafers, the so-called "Direct Write Technologies". In addition, the participants acquire the necessary basic knowledge for the chemical and physical characterization of these structures and for the construction of simple test structures for electrical characterization. The completion of the work is an internship work that has a self-contained topic in order to use the acquired knowledge targeted.

personal 1: 1 conversations, independent study of literature, 1: 1 device training, independent experimental work, writing a scientific report

Special laboratory with 1: 1 training in the clean room - ideal as a "trial internship" before starting a diploma thesis

intrinsic, orally

persönlich