362.074 CVD processes for nanoscale MOSFETS
This course is in all assigned curricula part of the STEOP.
This course is in at least 1 assigned curriculum part of the STEOP.

2020S, PR, 8.0h, 8.0EC
TUWEL

Properties

  • Semester hours: 8.0
  • Credits: 8.0
  • Type: PR Project

Learning outcomes

After successful completion of the course, students are able to...

deal with a key technology of modern silicon technology in the clean room, to deal in detail with the gas phase assisted deposition of extremely thin films.

Subject of course

Gas pase epitaxy is a key technology for the fabrication of silicon devices. The principles will be teached in a cleanroom labcourse.

Teaching methods

Lac-course in small groups.

Mode of examination

Oral

Lecturers

Institute

Examination modalities

intrinsic

Course registration

Registration modalities

Floragasse 7/I Ort: persönlich

Curricula

Study CodeObligationSemesterPrecon.Info
710 FW Elective Courses - Electrical Engineering Elective
786 710 Electrical Engineering Not specified

Literature

No lecture notes are available.

Accompanying courses

Miscellaneous

  • Attendance Required!

Language

German