Systematic overview on fundamentals, instrumentation, figures of merit, and application of the most important methods of surface and interface analysis
Overview on most important methods: photon probe techniques: surface analytical aspects of vibrational spectroscopy (RAMAN (SERS), IR (reflection- absorption technique)), x-ray absorption spectrometry (EXAFS, NEXAFS), photoelectron spectroscopy (XPS, UPS); electron probe techniques: analytical electron microscopy (TEM, THEED, TEELS), electron diffraction (LEED, RHEED), electron energy loss spectroscopy (EELS, REELS), scanning electron microscopy, electron probe microanalysis (EPXMA/SEM), Auger electron spectroscopy (AES); ion probe techniques: scatter methods (RBS, ISS), elastic recoil detection (ERD), sputter methods (secondary ion mass spectrometry (SIMS), secondary neutrals mass spectrometry (SNMS)), activation analysis (CPAA); field probe techniques: field ion microscopy, atom probe analysis; near-field scanning probe techniques: AFM, STM, SNOM. Physical fundamentals, instrumentation, data processing (quantification), and analytical figures of merit (scope and limitation). Discussion of examples for applications with advantages and disadvantages of different methods.