164.006 Chemical and Physical Vapour Deposition in Technology
This course is in all assigned curricula part of the STEOP.
This course is in at least 1 assigned curriculum part of the STEOP.

2019S, VO, 2.0h, 2.0EC

Properties

Semester hours: 2.0
Credits: 2.0
Type: VO Lecture

Aim of course

The fact that gas-solid reactions are widespread in technical processes will be demonstrated.

Subject of course

Gas-solid reactions used for the production of coatings will be presented. Technological aspects and possibilities for layer productions with CVD, PVD and other methods are demonstrated.Also gas-solid reactions e.g. for the production of powders and single crystals are discussed.

Lecturers

Institute

E164 Institute of Chemical Technologies and Analytics

Course dates

Day	Time	Date	Location	Description
	09:00 - 16:00	20.05.2019 - 22.05.2019	Besprechungszimmer 164 1. Stock - BB 01	Vorlesung

Show single appointments

Chemical and Physical Vapour Deposition in Technology - Single appointments

Day	Date	Time	Location	Description
Mon	20.05.2019	09:00 - 16:00	Besprechungszimmer 164 1. Stock - BB 01	Vorlesung
Tue	21.05.2019	09:00 - 16:00	Besprechungszimmer 164 1. Stock - BB 01	Vorlesung
Wed	22.05.2019	09:00 - 16:00	Besprechungszimmer 164 1. Stock - BB 01	Vorlesung

Examination modalities

mündlich

Course registration

Begin	End	Deregistration end
18.02.2019 00:00	31.05.2019 23:00

Registration modalities

die VO wird im Block abgehalten
Zeit und Ort: nach persönlicher Vereinbarung mit dem Vortragenden

Interessenten bitte anmelden, um die Teilnehmerzahl abschätzen zu können.

Curricula

Study Code	Obligation	Semester	Precon.	Info
730 Chemical and Process Engineering	Mandatory elective

Literature

No lecture notes are available.

Language

German