After successful completion of the course, students are able to descripe and model interactions of ion beams with solids.

In this course effects in the area of ion-solid interaction will be discussed and their mathematical description will be elaborated in detail. The contents of the lectures will be put into context of modern semi-conductor manufacturing techniques, ion beam therapy, surface processing and many more areas of applications. After successful completion of the course, in-depth knowledge of ion beam methods will enable the students to analyze problems, desing solutions and solve complex tasks.

Introduction into the field of particle solid interactions:

• sputtering
• ion implantation
• ion energy loss
• computer simulation (Monte-Carlo methods and Molecular Dynamics)
• Applications: production of thin films, material coating, ion implantation, surface analysis.

Lecture notes will be provided. Phenomena will be discussed and their modelling will be derived in the course. This includes qualitative models as well as quantitative mathematical descriptions. 

Note, that this semester the course starts in November. The first lecture will be held on Nov. 08th.

The lecture will only be given in person!

oral examination

Lecture notes for this course are available. They can be downloaded after registration in TISS.

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